Inpria ontwikkelt samen met SK hynix metaaloxide-resist om de complexiteit van patronen te verminderen voor DRAM van de volgende generatie
TOKIO–(BUSINESS WIRE)– JSR Corporation heeft vandaag de versnelling aangekondigd van haar gezamenlijke ontwikkeling met SK hynix Inc. om Inpria toe te passen, een Extreme Ultraviolet (EUV) metaal oxide resist (MOR) van een JSR-bedrijf voor de productie van geavanceerde DRAM-chips. Inpria’s breed gepatenteerde metaaloxide foto resist platform voor EUV stelt klanten in staat om geavanceerde node-device-architecturen efficiënt te modelleren.
De materiaaloplossingen van Inpria bieden de prestaties die nodig zijn om de kosten van EUV-patronen aanzienlijk te verlagen en zijn compatibel met beproefde processen en apparatuur configuraties. Inpria’s MOR kan worden aangebracht door middel van een standaard spincoating proces.
Inpria Co-Developing Metal Oxide Resist with SK hynix to Reduce Complexity of Patterning for Next-Generation DRAM
TOKYO–(BUSINESS WIRE)– JSR Corporation announced today acceleration of its co-development with SK hynix Inc. to apply Inpria, a JSR company’s Extreme Ultraviolet (EUV) metal oxide resist (MOR) for manufacturing advanced DRAM chips. Inpria’s broadly-patented metal oxide photoresist platform for EUV enables customers to efficiently pattern advanced node device architectures.
Inpria material solutions provide the performance needed to significantly reduce the cost of EUV patterning and are compatible with proven processes and equipment configurations. Inpria’s MOR can be applied by a standard spin coating process.
“EUV manufacturing is complex and requires cutting-edge materials,” said BK Lee, head of R&D process at SK hynix. “Tin-oxide resists show promise to deliver both on performance and also on lower manufacturing cost for the next generation of state-of-the-art DRAM.”
“JSR’s technology has always been based on materials innovation,” said Tadahiro Suhara, Managing Officer at JSR. “We are committed to accelerating SK hynix’s technology roadmap by enabling efficient printing of the smallest features. The science is pioneering but so are the economics.”
EUV is already in use in commercial production in the most advanced lithography processes used in semiconductor manufacturing and, as the industry moves to smaller critical dimensions in chip manufacturing, its use is expected to increase substantially.
Inpria is the leader in metal oxide EUV resists and has achieved the world’s highest resolution using EUV exposure systems. JSR acquired Inpria in 2021 and, as EUV adoption continues to increase, is investing in expanding production capabilities and customer support services for high volume manufacturing.
About JSR Corporation
JSR Corporation is a precision technology company that enables scientific advances and realizes their practical applications. Headquartered in Tokyo, Japan, JSR takes on the most demanding technological challenges as a global supplier to customers in leading-edge industries. Our products and services drive advances in the semiconductors that power our world, accelerate the development of new therapies for life-threatening illness, and much more. To learn more about how JSR is enriching societies around the world and enhancing quality of life, please visit www.jsr.co.jp.
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Missy Bindseil
mbindseil@jsrmicro.com
830-237-9527